Outgassing rates of aluminium table

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Outgassing rates of aluminium table

Outgassing rates of aluminium table
Note the different methods of measurement and treatment of samples.

Outgassing (also known as offgassing) occurs when gas is released from adhesives, encapsulants, lubricants, sealants, and other materials ferrous and non-ferrous.

Material	Treatment	Outgassing rate (torr-L/sec-cm²)	Time (hours)	Test method	Reference	Year
Aluminium	None	1x10^-6	1h	-	Schamus (ref Markley, et al)	1999
Aluminium	Degassed	1.7x10^-7	1h	-	Schmaus (ref Markley, et al)	1999
Aluminium	Degassed	2.7x10^-8	10h	-	Schmaus (ref Markley, et al)	1999
Aluminium 6061-T6	Baked 13.5h @ 300°C	1.4x10^-8	10h	-	Schmaus (ref Das)	1999
Aluminium	Cleaned	8x10^-9	10h	-	Schmaus (ref Blears, et al)	1999
Aluminium	Fresh, degreased w/ trichloroethylene & cleaned w/ ethyl alcohol	6.3x10^-9	1h	conductance	Elsey (ref Schram)	1975 (1963)
Aluminium	Degassed	4.6x10^-9	100h	-	Schmaus (ref Markley, et al)	1999
Aluminium 6061-T6	Baked @ 200°C	4.5x10^-9	10h	-	Schmaus (ref Das)	1999
Aluminium	Degassed 24h, degreased w/ trichloroethylene & cleaned w/ ethyl alcohol	4.14x10^-9	1h	conductance	Elsey (ref Schram)	1975 (1963)
Aluminium 6061-T6	None	2.5x10^-9	10h	-	Schmaus (ref Das)	1999
Aluminium 5083-O	Bell jar, as received, room temp.	2.18x10^-9	10.3h	Rate-of-rise	Schrank, et al	1964
Aluminium 5083-O	Bell jar, as received, room temp.	1.27x10^-9	8h	Conductance	Schrank, et al	1964
Aluminium 5083-O	Bell jar, as received, room temp.	6.6x10^-10	24h	Conductance	Schrank, et al	1964
Aluminium 5083-O	Bell jar, as received, room temp. after baking @ 220°C	4.6x10^-10	50h (baked @27-31h)	Conductance	Schrank, et al	1964
Aluminium 6061-T6	Baked 15h @ 300°C	1.6x10^-10	10h	-	Schmaus (ref Das)	1999
Aluminium	Degassed 24h, degreased w/ trichloroethylene & cleaned w/ ethyl alcohol	3.06x10^-10	1h	conductance	Elsey (ref Schram)	1975 (1963)
Aluminium 5083-O	Bell jar, no. 4 finish (lapped), room temp.	2.87x10^-10	6.0h	Rate-of-rise	Schrank, et al	1964
Aluminium	Fresh, degreased w/ trichloroethylene & cleaned w/ ethyl alcohol	6.0x10^-10	10h	conductance	Elsey (ref Schram)	1975 (1963)
Aluminium, type 1100	Cleaned w/ detergent, rinsed w/ acetone, pumped 24 hours	~10^-10	0	conductance	Young	1968
Aluminium	LEP vacuum chamber, chem.. clean, baked insitu @ 150°C	2.3x10^-10	24h	-	Mathewson, et al	1988
Aluminium 6061-T4	Degreased in acetone w/ methanol rinse; baked 100°C	6x10^-12	24h	Rate-of-rise & conductance	Halama, Herrera	1976
Aluminium 6061-T4	Degreased in acetone w/ methanol rinse, chem polished, baked 100°C	3x10^-12	24h	Rate-of-rise & conductance	Halama, Herrera	1976
Aluminium 6061-T4	Degreased in acetone w/ methanol rinse, chem polished, glow discharge in Ar, baked 100°C	5x10^-12	24h	Rate-of-rise & conductance	Halama, Herrera	1976
Aluminium, type 1100	Above plus baked 15h @ 250°C under vacuum	4x10^-12	24h @ room temp	conductance	Young	1968
Aluminium	PETRA vacuum chamber, glow discharge@145°C	1x10^-12	Up to 200h	In situ glow discharge, conductance	Mathewson, et al	1977

Reference: FermiLab